Title:
METHOD FOR PRODUCING COPPER COMPLEX SALT
Document Type and Number:
Japanese Patent JP2021014436
Kind Code:
A
Abstract:
To provide a method for producing a copper complex salt, which can produce a copper complex salt in high purity.SOLUTION: The method for producing a copper complex salt comprises: a reaction step of reacting a copper salt containing monovalent copper and a compound containing a ligand which forms a coordinate bond with monovalent copper to obtain a copper complex salt; a dissolution step of dissolving the copper complex salt in a cyclic ether which can dissolve the copper complex and the ligand to obtain a first solution; a copper complex salt deposition step of adding a solvent to the first solution and having the copper complex salt deposit in a finally obtained second solution; and a separation step of separating the deposited copper complex salt from the second solution to obtain the copper complex salt. In the reaction step, the copper complex salt has the ligand and the ligand has four coordination bonds formed via its four nitrogen atoms with one monovalent copper. In the copper complex salt deposition step, the solvent has a smaller relative density than the cyclic ether, has lower solubility for the copper complex salt the cyclic ether, and can dissolve the ligand.SELECTED DRAWING: None
Inventors:
YAMAGUCHI TAKASHI
Application Number:
JP2019130751A
Publication Date:
February 12, 2021
Filing Date:
July 14, 2019
Export Citation:
Assignee:
FUJIKURA LTD
International Classes:
C07F1/08
Attorney, Agent or Firm:
Hiroaki Aoki