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Title:
METHOD OF PRODUCING DISPLAY, DISPLAY, METHOD OF PRODUCING THIN FILM TRANSISTOR SUBSTRATE, AND THIN FILM TRANSISTOR SUBSTRATE
Document Type and Number:
Japanese Patent JP2009258638
Kind Code:
A
Abstract:

To provide a method of producing a display with which thin film transistors in which on-currents are uniform are obtained, and thus uneven luminance of light emitting elements connected to the thin film transistors is prevented, while decreasing the time necessary for a step of crystallization annealing of a semiconductor thin film.

Gate electrodes 14b are formed on a substrate 1 so that an arrangement of a source S and a drain D of a thin film transistor Tr2 formed in each of pixels a on the substrate 1 may be reversed in a pixel a row direction in a first pixel row A1 and a second pixel row A2. A gate insulating film 31 and an amorphous semiconductor thin film 32 are formed on the substrate 1 in such order so as to cover the gate electrodes. The semiconductor thin film 32 is crystallized by irradiating the semiconductor thin film 32 above the gate electrodes 14b with a laser beam Lh while scanning the laser beam Lh so that a scanning direction v(-v) may be directed from the drain D side toward the source S side in the pixel row direction.


Inventors:
SAGAWA HIROSHI
TOYOMURA TADASHI
Application Number:
JP2008323361A
Publication Date:
November 05, 2009
Filing Date:
December 19, 2008
Export Citation:
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Assignee:
SONY CORP
International Classes:
G09F9/30; H01L21/20; H01L21/336; H01L29/786; H01L51/50
Domestic Patent References:
JP2003045890A2003-02-14
JP2001320055A2001-11-16
JP2002366057A2002-12-20
JP2004087620A2004-03-18
JP2006140462A2006-06-01
Attorney, Agent or Firm:
Funabashi Kuninori