Title:
強制超薄膜回転式処理法を用いた微粒子の製造方法
Document Type and Number:
Japanese Patent JP5500597
Kind Code:
B2
Abstract:
The present invention provides a method for producing nanoparticles, which comprises maintaining a minute space of 1 mm or less between two processing surfaces capable of approaching to and separating from each other and being rotating relative to each other, allowing the minute space maintained between the two processing surfaces to serve as a flow path of a processed fluid thereby forming a forced thin film of the processed fluid and separating nanoparticles in the forced thin film.
Inventors:
Shinichi Enomura
Application Number:
JP2011149527A
Publication Date:
May 21, 2014
Filing Date:
July 05, 2011
Export Citation:
Assignee:
M Technique Co., Ltd.
International Classes:
B02C19/00; B01F25/74; B01J19/00; B02C7/14; B22F1/054; B82B3/00
Domestic Patent References:
| JP2004049957A | ||||
| JP2006249380A | ||||
| JP2006247615A | ||||
| JP8500289A |
Attorney, Agent or Firm:
Takenobu Samejima