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Patent Searching and Data


Title:
METHOD FOR PRODUCING FLUORENE-BASED COMPOUND
Document Type and Number:
Japanese Patent JP2012211089
Kind Code:
A
Abstract:

To provide a method for producing a fluorene-based compound efficiently obtainable with high purity, which is useful for introducing a fluorene skeleton into a polymer compound or the like.

A fluorene-based compound represented by formula (2) is obtained by a reaction of a compound represented by formula (1) and an acid. [In the formulas, Ar1 represents an aryl group or a monovalent heterocyclic group which may have a substituent. A plurality of Ar1s may be the same or different mutually. Either of X1 and X2 represents a hydrogen atom and the other represents a halogen atom. R1, R2, R3, R4. R5 and R6 each independently represents a hydrogen atom, alkyl, alkoxy, alkylthio, aryl, aryloxy, arylthio, arylalkyl, arylalkoxy, arylalkylthio, amino, silyl, acyl, acyloxy, imine residue, carbamoyl, acid imide, monovalent heterocyclic, cyano or nitro, which may have a substituent. R2 and R3, and R4 and R5 may be bonded to form a ring respectively mutually].


Inventors:
NAKATANI TOMOYA
Application Number:
JP2011076256A
Publication Date:
November 01, 2012
Filing Date:
March 30, 2011
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C17/23; C07C25/22
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshinori Shimizu
Takashi Mikami