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Patent Searching and Data


Title:
METHOD FOR PRODUCING HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JP2003114500
Kind Code:
A
Abstract:

To provide a method for producing a heat-developable photosensitive material which prevents an interlayer mixing and can obtain good coated surface conditions.

In the method for producing a heat-developable photosensitive material, a photosensitive layer, an intermediate layer and a protective layer are formed by a simultaneous multilevel coating to produce the heat-developable photosensitive material. At this time, the pH of a coating liquid for the intermediate layer is adjusted to 5-10, the viscosity of the coating liquid for the intermediate layer is adjusted to 20-150 mPa.s and a pH buffer salt is added to the coating liquid for the intermediate layer.


Inventors:
IWATO JUNPEI
Application Number:
JP2001308372A
Publication Date:
April 18, 2003
Filing Date:
October 04, 2001
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03C1/74; G03C1/498; (IPC1-7): G03C1/74
Attorney, Agent or Firm:
Kenzo Matsuura