To provide a method for producing an ink jet head in which failure of production is reduced through a production process for blocking progress of silicon etching and a silicon channel plate is provided while reducing the cost, and to provide an ink jet head and an ink jet recorder.

The method for producing an ink jet head comprises a step of forming a channel plate member of a silicon substrate by wet etching while differentiating the etching rate in the central part of the silicon substrate and at the circumferential part of edge, a step of forming a mask layer pattern of multilayer film on the silicon substrate, a step of forming a specified mask pattern required for forming a channel plate on the multilayer film on the opposite sides of a wafer through patterning and etching using a resist mask, and a step of performing wet etching using the patterned multilayer film as a mask material.