Title:
METHOD FOR PRODUCING OCTAFLUORO[2,2]PARACYCLOPHANE
Document Type and Number:
Japanese Patent JP3869177
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for producing octafluoro[2,2]paracyclophane in high yield by using an industrially produced compound as a main raw material.
SOLUTION: This method for producing octafluoro[2,2]paracyclophane is composed of a step (first step) reacting 1,4-bistrifluoromethylbenzene with a halogenated silane represented by general formula (1): R3SiX (1) (wherein, Rs denote each an alkyl or an aryl independently; and X denotes a halogen) in the presence of a metal having low valence to obtain a compound represented by general formula (2) (wherein, Rs denote each an alkyl or an aryl independently) and a step (second step) dimerizing the compound represented by general formula (2) in the presence of fluoride ion.
Inventors:
Kenji Uneyama
Hideki Ami
Hideki Ami
Application Number:
JP2000035548A
Publication Date:
January 17, 2007
Filing Date:
February 14, 2000
Export Citation:
Assignee:
Central Glass Co., Ltd.
International Classes:
B01J21/10; C07C22/08; C07B61/00; C07C17/26; C07C17/263; C07C17/281; C07F7/08; (IPC1-7): C07C22/08; B01J21/10; C07C17/263; //C07B61/00
Domestic Patent References:
| JP2001213819A | ||||
| JP2001213818A | ||||
| JP2001515507A | ||||
| JP11513689A | ||||
| JP5255149A |
Attorney, Agent or Firm:
Yoshiaki Hanada