METHOD OF PRODUCING PATTERN OF CONDUCTIVE MATERIAL

Title:

METHOD OF PRODUCING PATTERN OF CONDUCTIVE MATERIAL

Document Type and Number:

Japanese Patent JPS6097642

Kind Code:

A

Abstract:

A method of providing narrow conductor tracks (metal silicide). According to the invention, a pattern of polycrystalline silicon (3) covered by a protective layer (4) is converted along the edges into silicide. This is effected in that the device is covered by a suitable metal (7) and is then silicidized laterally over a distance of 20-500 nm. The remaining silicon (3) is removed selectively. The tracks (8) obtained can serve as conductor masks or, for example, as a plate of a capacitor.

Inventors:

PIEERE HERUMANUSU UORUREE
YOHANESU FURANSHISUKASU KORUNE

Application Number:

JP21153484A

Publication Date:

May 31, 1985

Filing Date:

October 11, 1984

Export Citation:

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Assignee:

PHILIPS NV

International Classes:

H01L21/3205; H01L21/02; H01L21/033; H01L21/266; H01L21/28; H01L21/3213; H01L21/336; H01L21/339; H01L23/52; (IPC1-7): H01L21/88

Attorney, Agent or Firm:

Akihide Sugimura

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