Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ポリアセタール樹脂組成物の製造方法
Document Type and Number:
Japanese Patent JP6802317
Kind Code:
B2
Abstract:
A method for producing a polyacetal resin composition which allows for suppression of formaldehyde generation from a molded article to an extremely low level, and stable suppression of mold deposits during molding. The polyacetal resin composition contains: 100 parts by mass of a polyacetal polymer (A); 0.01 to 0.50 parts by mass of an aliphatic carboxylic acid hydrazide (B); 0.001 to 0.50 parts by mass of a hydantoin compound having two hydrazinocarbonylalkyl groups (C); and 0.001 to 0.30 parts by mass of an alkaline earth metal salt of aliphatic carboxylic acid (D), wherein the total amount of the components (B) and (C) with respect to 100 parts by mass of the polyacetal polymer (A) is 0.03 to 0.55 parts by mass, and the polyacetal polymer (A) is a polyacetal copolymer obtained by copolymerizing trioxane as a principal monomer (a) with a cyclic ether having at least one carbon-carbon bond as a comonomer (b) using a heteropolyacid represented by general formula (1) as a polymerization catalyst (c) to obtain a reaction product, and subsequently adding a carbonate of an alkali metal element or alkaline earth metal element (d) to the reaction product to deactivate the polymerization catalyst (c).

Inventors:
Akihiro Tamaoka
Hatsuhiko Harashina
Tomohiro Kadoma
Application Number:
JP2019085375A
Publication Date:
December 16, 2020
Filing Date:
April 26, 2019
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Polyplastics Co., Ltd.
International Classes:
C08L59/00; C08K5/09; C08K5/25; C08K5/3445
Domestic Patent References:
JP2009286874A
JP2013237742A
JP2015514840A
JP2019065233A
JP2005162913A
JP2006257166A
JP2008031348A
JP2005163019A
Foreign References:
WO2001005888A1
WO2005044917A1
Attorney, Agent or Firm:
Masayuki Masabayashi
Hayashi Ichiyoshi