Title:
高分子化合物の製造方法
Document Type and Number:
Japanese Patent JP6614957
Kind Code:
B2
Abstract:
A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).
Inventors:
Masatoshi Arai
Yoshimuro Komuro
Akira Kawakami
Yoshimuro Komuro
Akira Kawakami
Application Number:
JP2015244592A
Publication Date:
December 04, 2019
Filing Date:
December 15, 2015
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
C08F8/00; C08F220/02
Domestic Patent References:
| JP2013246203A | ||||
| JP2014130308A | ||||
| JP2012168335A | ||||
| JP9227755A | ||||
| JP2001294619A | ||||
| JP5132513A |
Other References:
ITO,H. et al.,Silyl-protected hydroxystyrenes: Living anionic polymerization at room temperature and selective desililation.,Journal of Polymer Science: Part A: Polymer Chemistry,2000年,Vol.38,p.2415-2427
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Matsumoto
Ryu Miyamoto
Masato Iida
Masatake Shiga
Matsumoto
Ryu Miyamoto
Masato Iida