Title:
塩、酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6688147
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt and a resin to be used for a resist composition, and a resist composition, from which a resist pattern can be produced with good CD uniformity.SOLUTION: The present invention discloses a compound represented by formula (I), an acid generator, a resin and a resist composition. In the formula, Qand Qeach independently represent a fluorine atom or a perfluoroalkyl group; Rand Reach independently represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; Xrepresents *-CO-O-, *-O-CO- or *-O-; Arepresents a hydrocarbon group having a divalent alicyclic hydrocarbon group; Arepresents a divalent hydrocarbon group; Rand Reach independently represent a hydrogen atom or a monovalent saturated hydrocarbon group; Rrepresents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; and A represents a group of formula (I-A), where Arepresents a divalent hydrocarbon group or the like.SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Takashi Nishimura
Koji Ichikawa
Takashi Nishimura
Koji Ichikawa
Application Number:
JP2016090668A
Publication Date:
April 28, 2020
Filing Date:
April 28, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08F20/38; C07D207/46; C07D209/48; C07D217/24; C07D221/14; C08F246/00; G03F7/004; G03F7/039
Domestic Patent References:
| JP2010053121A | ||||
| JP2012226339A | ||||
| JP2011215619A | ||||
| JP2010116550A | ||||
| JP2013082893A | ||||
| JP2013227466A | ||||
| JP2015018107A | ||||
| JP2014085472A | ||||
| JP2013007031A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation