Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6959727
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt capable of producing a resist pattern in a good shape, an acid generator, and a resist composition containing the same.SOLUTION: The salt represented by formula (I), the acid generator, and the resist composition are provided. [In formula (I), Qand Qeach independently represent a fluorine atom or a 1-6C perfluoroalkyl group; Lrepresents a 1-24C divalent saturated hydrocarbon group; -CH- contained in the saturated hydrocarbon group may be substituted with -O- or -CO-; a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group; Ad represents an adamantane triyl group; each Rindependently represents a hydrogen atom or an organic group containing a cyclic ether structure, provided that at least one Rrepresents an organic group containing a cyclic ether structure; and Zrepresents an organic cation.]SELECTED DRAWING: None
Inventors:
Isao Yoshida
Mutsuko Higo
Koji Ichikawa
Mutsuko Higo
Koji Ichikawa
Application Number:
JP2016213194A
Publication Date:
November 05, 2021
Filing Date:
October 31, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D303/48; C07D305/06; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP6757234B2 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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