Title:
塩、酸発生剤、樹脂、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7044561
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt capable of producing a resist pattern with good line edge roughness, a resin, a resist composition, and a method for producing a resist pattern.SOLUTION: The salt is represented by formula (I) [where Qand Qeach represent F or a perfluoroalkyl group; Rand Reach represent H, a perfluoroalkyl group, or the like; z represents an integer of 0-6; Xrepresents *-CO-O-, *-O-CO-, or the like; Arepresents a divalent hydrocarbon group which may have a substituent; Arepresents a single bond or a hydrocarbon group which may have a substituent; Rand Reach represent H or a saturated hydrocarbon group; Rrepresents H or a methyl group; Lrepresents a specific group having a phenyl group; and Zrepresents an organic cation].SELECTED DRAWING: None
Inventors:
Yoshida Isao
Takashi Nishimura
Koji Ichikawa
Takashi Nishimura
Koji Ichikawa
Application Number:
JP2018005171A
Publication Date:
March 30, 2022
Filing Date:
January 16, 2018
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/12; C07C309/17; C07C381/12; C08F12/30; C08F20/38; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP6857086B2 | ||||
| JP2016210982A | ||||
| JP2014197168A | ||||
| JP2013082894A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation