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Title:
METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE FILM AND TRANSPARENT CONDUCTIVE FILM
Document Type and Number:
Japanese Patent JP2012146548
Kind Code:
A
Abstract:

To provide a method for producing a transparent conductive film, which can lower a resistance of a metal silver portion without causing deterioration and the like in display quality of the metal silver portion even when the metal silver portion is irradiated with light from a xenon lamp, and can lower a surface resistance of a transparent conductive film to be produced when the transparent conductive film is produced by exposing a silver salt emulsion layer and then subjecting the silver salt emulsion layer to developing treatment, and to provide the transparent conductive film.

The method for producing the transparent conductive film 10 comprises: a first exposing step of subjecting a photosensitive material that has the silver salt emulsion layer 24 formed on a base 12 to exposing treatment; and a developing step of subjecting the silver salt emulsion layer 24 after the exposing treatment to the developing treatment and forming a conductive pattern 16 of the metal silver portion 14 on the base 12. The method further comprises a second exposing step of irradiating the metal silver portion 14 after the developing treatment with pulse light from the xenon flash lamp. A volume ratio of silver/a binder in the silver salt emulsion layer 24 of the photosensitive material is 0.5/1 or more and 6/1 or less.


Inventors:
TOKUNAGA TSUKASA
SASAKI HIROTOMO
Application Number:
JP2011004791A
Publication Date:
August 02, 2012
Filing Date:
January 13, 2011
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
H01B13/00; G03C1/00; H01B5/14
Domestic Patent References:
JP2008218264A2008-09-18
JP2009129607A2009-06-11
JP2010160911A2010-07-22
JP2009152072A2009-07-09
Attorney, Agent or Firm:
Takehiro Chiba
Toshiyuki Miyadera
Shuji Ouchi



 
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