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Patent Searching and Data


Title:
METHOD FOR PURIFYING METHANE
Document Type and Number:
Japanese Patent JPH04300615
Kind Code:
A
Abstract:

PURPOSE: To remove impurities from gaseous methane (CH4) without discharging hazardous substances, without the danger of the purified gas later to be polluted again and yet without decomposition of CH4 by using a getter alloy which is not hydrogenated.

CONSTITUTION: CH4 containing H2O and O2 or the like is circulated through a purification device 10 having a room 14, equipped with an impure gas inlet 12 and a purified gas outlet 18 and storing pellets of Zr-V-Fe alloy 16 with a composition by weight of 45-75% Zr, 20-50% V and 5-35% Fe. Zr-V-Fe alloy 16 has previously been activated at 400-950°C to be gas adsorptive. The impure CH4 is brought into contact with the alloy at <400°C at which temp. CH4 is not adsorbed. This is useful as the methane for the formation of a thin film of diamond or the like.


Inventors:
MARUKO SUTSUCHI
KARORINA SORUCHIA
Application Number:
JP35307291A
Publication Date:
October 23, 1992
Filing Date:
December 18, 1991
Export Citation:
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Assignee:
GETTERS SPA
International Classes:
B01J20/02; B01J20/34; C07C7/12; C07C7/148; C07C9/04; B01D53/02; (IPC1-7): B01D53/02; B01J20/02; B01J20/34; C07C7/12; C07C9/04
Attorney, Agent or Firm:
Takashi Ishida (5 others)