Title:
メタンスルホン酸の精製方法、及び精製されたメタンスルホン酸の使用方法
Document Type and Number:
Japanese Patent JP7310350
Kind Code:
B2
Abstract:
To provide a method for purifying methanesulfonic acid, which can increase purity of even methanesulfonic acid used once in synthesis of a PAEK resin to such a degree that it can be used again for synthesis of the PAEK resin.SOLUTION: Provided is a method for purifying methanesulfonic acid for obtaining purified methanesulfonic acid from a first mixture containing methanesulfonic acid, an organic solvent and/or water, and polyphosphoric acid and/or a polyphosphoric acid ester, comprising: a first step of distilling the first mixture and, thereby, distilling off the organic solvent and/or water from the first mixture; a second step of distilling a distillation residue obtained in the first step and, thereby, distilling off methanesulfonic acid from the distillation residue; and a third step of distilling a second mixture distilled off as a distillate in the second step and containing methanesulfonic acid and, thereby, distilling off the organic solvent and/or water from the second mixture.SELECTED DRAWING: None
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Inventors:
Takuya Sone
Ryuichi Matsuoka
Masaya Masumoto
Ryuichi Matsuoka
Masaya Masumoto
Application Number:
JP2019114699A
Publication Date:
July 19, 2023
Filing Date:
June 20, 2019
Export Citation:
Assignee:
DIC Corporation
International Classes:
C07C303/44; C07C309/04; C08G67/00
Domestic Patent References:
| JP5242819A | ||||
| JP2002540066A | ||||
| JP61247731A |
Foreign References:
| WO2015182621A1 |
Other References:
Polymer Journal,1989年,21(9),pp.673-679
Attorney, Agent or Firm:
Takayuki Ohno
Akihiro Iwamoto
Hidefumi Sugaya
Masahiro Niwa
Akihiro Iwamoto
Hidefumi Sugaya
Masahiro Niwa