Title:
単量体組成物の精製方法及び重合体の製造方法
Document Type and Number:
Japanese Patent JP7180241
Kind Code:
B2
Abstract:
To provide a purification method of a monomer composition, with which at least a part of impurities contained in the monomer composition including a polycyclic aromatic vinyl compound and involving a risk of obstructing the polymerization reaction can be removed.SOLUTION: Disclosed is a purification method of a monomer composition including a polycyclic aromatic vinyl compound having at least two monocycles which are selected from a group consisting of an aromatic hydrocarbon monocycle and an aromatic heterocyclic monocycle. The purification method includes a sulfur removal step to remove sulfur from the monomer composition.SELECTED DRAWING: None
Inventors:
Yusuke An
Kensaku Fujii
Kensaku Fujii
Application Number:
JP2018180497A
Publication Date:
November 30, 2022
Filing Date:
September 26, 2018
Export Citation:
Assignee:
Zeon Corporation
International Classes:
C08F12/32; C07C7/12; C07C15/44; C08F257/00; C08F297/02
Domestic Patent References:
| JP2006111650A | ||||
| JP2017119756A | ||||
| JP2002003506A | ||||
| JP2016011366A | ||||
| JP2016160387A |
Foreign References:
| WO2016035866A1 | ||||
| WO2013080967A1 |
Attorney, Agent or Firm:
Kenji Sugimura
Mitsutsugu Sugimura
Yuta Terashima
Hitomi Yuki
Mitsutsugu Sugimura
Yuta Terashima
Hitomi Yuki