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Title:
METHOD FOR REFINING HIGH-PURITY TITANIUM
Document Type and Number:
Japanese Patent JPH07252551
Kind Code:
A
Abstract:

PURPOSE: To improve the purity of the obtained Ti at the time of synthesizing TiI2 and TiI3 by the reaction of crude Ti with TiI4 and then thermally decomposing the TiI2, etc., to produce high-purity Ti by adding a Ti halide to the TiI4.

CONSTITUTION: Crude Ti 13 such as sponge Ti is put in a reaction vessel 1, and the vessel 1 is evacuated and heated to 700-900°C with a heating furnace 2. A high-purity Ti tube 7 in the vessel 1 is then heated to 1100-1300°C with a heater 10. A gas obtained by mixing TiI4 5 with 1-30mol% of a halogen and Ti halide 16 such as TiCl4 is supplied into the vessel 1 to form a lower Ti iodide such as TiI2 by the reaction of the crude Ti 13 with the TiI4, the TiI2 is thermally decomposed, Ti is deposited on the surface of the Ti tube 7, and TiI4 is reused for the reaction with crude Ti. Fe and Ni as the impurities in the crude Ti are not iodinated or chlorinated, Cr easy to iodinate is not iodinated due to the presence of TiCl4 and left in the crude Ti, and high-purity Ti having a low content of impurities is obtained.


Inventors:
YOSHIMURA YASUTOKU
KOBAYASHI KAZUO
KURAMOTO MAKOTO
Application Number:
JP6658694A
Publication Date:
October 03, 1995
Filing Date:
March 09, 1994
Export Citation:
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Assignee:
SUMITOMO SITIX CORP
International Classes:
C22B34/12; (IPC1-7): C22B34/12
Attorney, Agent or Firm:
Raw form Motoshige (1 person outside)