Title:
METHOD FOR REMOVING CARBONATE IN RESIST DEVELOPING SOLUTION, REMOVING DEVICE, AND METHOD FOR CONTROLLING CONCENTRATION OF RESIST DEVELOPING SOLUTION
Document Type and Number:
Japanese Patent JP2006189646
Kind Code:
A
Abstract:
To provide a method and a device for removing carbonates from a resist developing solution containing TMAH (tetramethylammonium hydroxide) and carbonates, and to provide a method for controlling the concentration of a resist developing solution.
The method for removing carbonates in the resist developing solution includes a filtration step of filtering a resist developing solution containing TMAH and carbonates through an NF (nano filtration) membrane.
Inventors:
UMEEDA TAKAMICHI
KITAGAWA YOSHIYA
KITAGAWA YOSHIYA
Application Number:
JP2005001703A
Publication Date:
July 20, 2006
Filing Date:
January 06, 2005
Export Citation:
Assignee:
NAGASE & CO LTD
NAGASE CMS TECHNOLOGY CO LTD
NAGASE CMS TECHNOLOGY CO LTD
International Classes:
G03F7/26; G03F7/32; H01L21/027
Domestic Patent References:
| JPH11192481A | 1999-07-21 | |||
| JPH06142460A | 1994-05-24 | |||
| JP2000155426A | 2000-06-06 | |||
| JP2003295470A | 2003-10-15 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Shiro Terasaki
Takashi Mikami
Shiro Terasaki
Takashi Mikami
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