Title:
２，３，３，３－テトラフルオロプロペン生成物中のハロゲン化エチレン不純物を除去する方法
Document Type and Number:
Japanese Patent JP7470744
Kind Code:
B2
Abstract:
The present process relates to a process comprising: contacting a mixture comprising 2,3,3,3-tetrafluoropropene and at least one halogenated ethylene impurity with at least one adsorbent or at least one chemisorption catalyst to reduce the concentration of said at least one halogenated ethylene impurity.
More Like This:
Inventors:
Wong, Hai Yu
Toon, Soo Seung
Toon, Soo Seung
Application Number:
JP2022115527A
Publication Date:
April 18, 2024
Filing Date:
July 20, 2022
Export Citation:
Assignee:
Honeywell International Inc.
International Classes:
C07C21/18; C07C17/25; C07C17/389
Domestic Patent References:
| JP2009227675A | ||||
| JP2012001495A | ||||
| JP2006518363A | ||||
| JP2013508265A |
Foreign References:
| WO2012067980A1 | ||||
| WO2008001844A1 |
Attorney, Agent or Firm:
Osamu Yamamoto
Toru Miyamae
Junichi Matsuo
Toyoharu Matsuda
Toru Miyamae
Junichi Matsuo
Toyoharu Matsuda