Title:
METHOD FOR SYNTHESIZING POLYNAPHTHYLENE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERN, AND ELECTRONIC PART
Document Type and Number:
Japanese Patent JP2003183362
Kind Code:
A
Abstract:
To provide a method for synthesizing a polynaphthylene having a high molecular weight and excellent in heat resistance cleanly and industrially, and a positive photosensitive resin composition using the polynaphthylene.
The method for synthesizing a polynaphthylene having a recurring unit represented by general formula (2) comprises a step of reacting a naphthalene derivative having a structure represented by general formula (1) in the presence of a catalyst in a liquid phase. The positive photosensitive resin composition comprises the thus-obtained polynaphthylene and a compound (B) generating an acid by light irradiation.
Inventors:
UEDA MITSURU
SASADA YASUYUKI
KO MASAHIKO
SASADA YASUYUKI
KO MASAHIKO
Application Number:
JP2001387845A
Publication Date:
July 03, 2003
Filing Date:
December 20, 2001
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
G03F7/039; C08G61/10; H01L21/027; (IPC1-7): C08G61/10; G03F7/039; H01L21/027