Title:
METHOD OF TREATING INDUSTRIAL WASTE WATER
Document Type and Number:
Japanese Patent JP2003002706
Kind Code:
A
Abstract:
To dispose waste water from a semiconductor factory or a machine factory while effectively utilizing the waste water.
The waste water S discharged from the semiconductor factory or the machine factory, in which alcohol or a surfactant is contained, is charged into a crusher such as a raw material mill 2, a finish mill 10 or a coal mill 20 of a cement manufacturing equipment as a crushing assistant and disposed.
Inventors:
TAKIGUCHI RYOICHI
KOMATSU YOSHIAKI
KOMATSU YOSHIAKI
Application Number:
JP2001187115A
Publication Date:
January 08, 2003
Filing Date:
June 20, 2001
Export Citation:
Assignee:
MITSUBISHI MATERIALS CORP
International Classes:
C02F1/00; B02C23/06; C04B7/44; C04B7/52; C04B18/04; C04B18/18; (IPC1-7): C04B7/52; B02C23/06; C02F1/00
Domestic Patent References:
JPH01119351A | 1989-05-11 | |||
JPS59121141A | 1984-07-13 | |||
JPH06343974A | 1994-12-20 | |||
JPS58105042A | 1983-06-22 | |||
JPH0929243A | 1997-02-04 | |||
JPS4892269A | 1973-11-30 | |||
JP2000239050A | 2000-09-05 | |||
JPH11116290A | 1999-04-27 |
Attorney, Agent or Firm:
Chiharu Shimizu (1 outside)