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Patent Searching and Data


Title:
METHOD FOR VERIFYING PROXIMITY EFFECT CORRECTION OF MODEL BASE
Document Type and Number:
Japanese Patent JP2004029193
Kind Code:
A
Abstract:

To provide a method for verifying a proximity effect correction method for a model base which makes it possible to detect an error inherent in a model or algorithm.

A test pattern is generated in a step S1. In S2, transfer to the test pattern is simulated by using a model used for the proximity effect correction method for the model base. In S3, a table of proximity effect correction values when a proximity effect correction method for a rule base is applied is generated based upon the transfer simulation result. In S4, a 2nd correction pattern is generated by using the table of proximity effect correction values. In S5, the 1st correction pattern and 2nd correction pattern are compared with each other. In S6, it is judged that the model and algorithm of the proximity effect correction method for the model base have no error when the pattern separation quantity of a line part of the 2nd correction pattern which corresponds to a line part of the 1st correction pattern is smaller than a permissible deviation value and have errors when larger.


Inventors:
OGAWA KAZUHISA
KAWAHARA KAZUYOSHI
ONUMA EIJU
Application Number:
JP2002182639A
Publication Date:
January 29, 2004
Filing Date:
June 24, 2002
Export Citation:
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Assignee:
SONY CORP
International Classes:
G03F1/36; G03F1/68; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Attorney, Agent or Firm:
Yoshimi Hatanaka