To effectively remove the foreign matter existing on a substrate without exerting damage on the substrate by irradiating the substrate with UV light for a specified period of time by using a UV irradiation device which generates the UV light having a specific wavelength, then washing the substrate by using an alkaline washing liquid.
This apparatus has a first treating vessel 1 disposed with the UV irradiation device 8 for irradiating the substrate with UV light of which ≥90% of the total UV light to be generated is a wavelength of 170 to 180 nm. A second treating vessel 2 for treating the substrate by using the alkaline liquid is disposed behind the same. Third to fifth treating vessels 3 to 5 for executing a pure water treatment and a six treating vessel 6 having an air knife 13 for carrying out liquid draining are successively disposed. About 1.0% tetramethyl ammonium hydroxide is used as the alkaline soln. to be used in the second treating vessel 2. The apparatus is so constituted that the pure water is used only in the fifth target vessel 5 among the treating vessels 3 to 5 and that the pure water supplied by a cascade system is used in the third and fourth treating vessels 4.
TOMIMATSU SHINJI
SUZUKI TETSUO
GOTO TETSUYA
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