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Title:
CHEMICAL COMPOUND, RESIN, RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN
Document Type and Number:
Japanese Patent JP2022008154
Kind Code:
A
Abstract:
To provide a chemical compound, a resin and a resist composition including the same that enable production of a resist pattern with excellent CD uniformity (CDU).SOLUTION: Provided are a chemical compound expressed by a formula (I), a resin and a resist composition [m4 denotes 2 or 3. R5 denotes a halogen atom or an alkyl group, and -CH2- included in the group may be substituted with -O- or -CO-. m5 denotes an integer 0 to 3.].SELECTED DRAWING: None

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Inventors:
SHIMADA MASAHIKO
ICHIKAWA KOJI
Application Number:
JP2021096171A
Publication Date:
January 13, 2022
Filing Date:
June 08, 2021
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F246/00; C07C69/712; C07C69/80; C07D321/10; C08F220/30; G03F7/004; G03F7/038; G03F7/039
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation



 
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