Title:
化合物、樹脂、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7066577
Kind Code:
B2
Abstract:
To provide a compound capable of producing a resist pattern with good line edge roughness (LER), a resin having a structural unit derived from the compound, and a resist composition containing the resin.SOLUTION: The compound is represented by formula (I) [Rand Rare each OH or a group represented by formula (R-1)-(R-3); * is a bonding position to Aror Ar; Aris an optionally substituted C6-36 aromatic hydrocarbon ring; and Aris an optionally substituted C6-36 aromatic hydrocarbon ring].SELECTED DRAWING: None
Inventors:
Hiroshi Sakamoto
Higo Mutsuko
Koji Ichikawa
Higo Mutsuko
Koji Ichikawa
Application Number:
JP2018163214A
Publication Date:
May 13, 2022
Filing Date:
August 31, 2018
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D307/83; C07C381/12; C07D307/86; C07D319/08; C08F220/30; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2019059715A | ||||
| JP2019059716A | ||||
| JP2019059714A |
Foreign References:
| WO2015045739A1 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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