Title:
電気化学槽の化学成分の量を制御する方法および装置
Document Type and Number:
Japanese Patent JP2004534909
Kind Code:
A
Abstract:
An automated chemical management system for managing the chemical content of an electrochemical bath used to deposit a material on the surface of a microelectronic workpiece is set forth. The automated chemical management system includes a dosing system that is adapted to dose an amount of one or more chemicals to replenish a given electrochemical bath constituent in accordance with a predetermined dosing equation. The chemical management system also includes an analytical measurement system that is adapted to provide a measurement result indicative of the amount of the given constituent in the electrochemical bath at predetermined time intervals. The chemical management system uses the measurement results to modify the dosing equation of the dosing system. In this manner, the replenishment operations executed by the chemical management system are effectively refined over time thereby providing more accurate control of the amount of the target constituent in the electrochemical bath.
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Inventors:
Fulton Dakin
Ritzdorf Thomas El
Ritzdorf Thomas El
Application Number:
JP2003512468A
Publication Date:
November 18, 2004
Filing Date:
July 08, 2002
Export Citation:
Assignee:
Semitour Incorporated
International Classes:
C25D21/14; G05D11/13; (IPC1-7): C25D21/14
Attorney, Agent or Firm:
Akihiro Ryuka