システムパラメータを制御するための方法及び装置

Japanese Patent JP4847644

B2

A method and an apparatus for controlling system parameters, in particular for controlling the voltage applied to piezoelectric elements (10, 20, 30, 40, 50, 60) within a circuit (A) for charging and discharging piezoelectric elements (10, 20, 30, 40, 50, 60) are described. The method is characterized by modifying at least one control parameter for the control of a system parameter, in particular a target voltage for the voltage applied to a piezoelectric element (10, 20, 30, 40, 50, 60), in view of at least one systematic error occurring during a first control procedure of the system parameter to obtain a corrected control parameter for a second and/or a further control of the system parameter. The apparatus is particularly eligible for use with the inventive method.

WO/2001/030486	APPARATUS FOR DISPENSING PREDETERMINED PROPORTIONS OF LIQUIDS OF DIFFERENT SPECIFIC WEIGHTS CONTAINED IN THE SAME TANK
WO/2012/087492	SYSTEM AND METHODS FOR PERSONALIZED PILL COMPOUNDING
WO/2011/087383	APPARATUS FOR REGULATING TWO-PHASE FLOW AND PORTABLE ATOMIZER BASED ON TWO-PHASE FLOW

Johannes-Jerck Ruger
Matthias Mulodik
Volker Pizzal
Udo Schulz

JP2001103982A

December 28, 2011

April 02, 2001

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ROBERT BOSCH GMBH

G05D11/00; H02N2/00; F02D41/20; F16K31/02; G05B13/02; H01L41/04; H01L41/083; H02N2/06; F02D41/00; F02D41/34

JP11026827A
JP3065066A
JP6000978A
JP6062585A
JP10288119A
JP11317551A
JP6114595A
JP63130356A

Toshio Yano
Takuya Kuno
Einzel Felix-Reinhard

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