Title:
光学系の特徴を測定する方法及び装置
Document Type and Number:
Japanese Patent JP4781414
Kind Code:
B2
Abstract:
Characterization of an optical system (18) is quickly and easily obtained in a single acquisition step by obtaining image data within a volume of image space (20). A reticle (16) and image plane (22) are positioned obliquely with respect to each other such that a reticle having a plurality of feature sets (116a-e) thereon, including periodic patterns or gratings (216a-e), is imaged in a volume of space, including the depth of focus. Metrology tools are used to analyze the detected or recorded image in the volume of space through the depth of focus in a single step or exposure to determine the imaging characteristics of an optical system. Focus, field curvature, astigmatism, spherical, coma, and/or focal plane deviations may be determined. The present invention is particularly applicable to semiconductor manufacturing and photolithographic techniques used therein, and is able to quickly characterize an optical system in a single exposure with dramatically increased data quality and continuous coverage of the full parameter space.
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Inventors:
Matthew E Hansen
Application Number:
JP2008231696A
Publication Date:
September 28, 2011
Filing Date:
September 10, 2008
Export Citation:
Assignee:
AS ML Holding N.V.
International Classes:
G01M11/02; G03F1/08; G02B27/00; G03F7/20; G03F7/207; H01L21/027
Domestic Patent References:
| JP4078126A | ||||
| JP10254123A | ||||
| JP3089512A | ||||
| JP3155112A | ||||
| JP11304653A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki