Title:
プラズマインピーダンスを決定するための方法及び装置
Document Type and Number:
Japanese Patent JP2007507848
Kind Code:
A
Abstract:
A plasma processing system, method, and computer readable medium for measuring plasma impedance. The system includes a chamber configured to contain a plasma and including a chuck within an interior area of the chamber, the chuck including a support surface and a bottom surface, and a first voltage-current probe positioned at a first position located exterior to the chamber and on a radio-frequency transmission line between the chamber and a power source. The system also includes a simulation module connected to the first voltage-current probe and arranged to solve, based on measurements transmitted from the first voltage-current probe, a radio-frequency model of the radio-frequency transmission line between the first position and a second position located within the chamber.
Inventors:
Mitrovic, Andrey S.
Application Number:
JP2006533877A
Publication Date:
March 29, 2007
Filing Date:
September 22, 2004
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/00; B23K9/00; B23K9/02; C23C16/505; H01J37/32; H01L21/205; H01L21/3065; H05H1/46; H01L
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Ryo Hashimoto
Tetsuya Kazama
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Ryo Hashimoto
Tetsuya Kazama