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Patent Searching and Data


Title:
プラズマインピーダンスを決定するための方法及び装置
Document Type and Number:
Japanese Patent JP2007507848
Kind Code:
A
Abstract:
A plasma processing system, method, and computer readable medium for measuring plasma impedance. The system includes a chamber configured to contain a plasma and including a chuck within an interior area of the chamber, the chuck including a support surface and a bottom surface, and a first voltage-current probe positioned at a first position located exterior to the chamber and on a radio-frequency transmission line between the chamber and a power source. The system also includes a simulation module connected to the first voltage-current probe and arranged to solve, based on measurements transmitted from the first voltage-current probe, a radio-frequency model of the radio-frequency transmission line between the first position and a second position located within the chamber.

Inventors:
Mitrovic, Andrey S.
Application Number:
JP2006533877A
Publication Date:
March 29, 2007
Filing Date:
September 22, 2004
Export Citation:
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Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/00; B23K9/00; B23K9/02; C23C16/505; H01J37/32; H01L21/205; H01L21/3065; H05H1/46; H01L
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Ryo Hashimoto
Tetsuya Kazama