Title:
ニトリル/フルオロアルコールポリマー含有フォトレジストおよび関連するミクロリソグラフィのための方法
Document Type and Number:
Japanese Patent JP2004500596
Kind Code:
A
Abstract:
Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography are described. These photoresists are comprised of a fluoroalcohol functional group and a nitrile-containing compound which together simultaneously impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.
Inventors:
Michael Frid
Frank Leonard Shut The Third
Mukan Periya Sammy
Frank Leonard Shut The Third
Mukan Periya Sammy
Application Number:
JP2001539078A
Publication Date:
January 08, 2004
Filing Date:
November 14, 2000
Export Citation:
Assignee:
E.I.DU PONT DE NEMOURS AND COMPANY
International Classes:
C08F216/02; C08F216/14; C08F220/42; C08F220/44; C08F232/00; G03F7/004; G03F7/038; G03F7/033; G03F7/039; H01L21/027; (IPC1-7): G03F7/033; C08F216/14; C08F220/42; C08F232/00; G03F7/038; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Yoshikazu Tani
Kazuo Abe
Denichi Hashimoto
Kazuo Abe
Denichi Hashimoto