Micro lithography projection aligner

Japanese Patent JP6222594

B2

The EUV projection exposure apparatus (10) has a projection light source and a heating light source that respectively generate projection light ray and heating light ray. The catoptric projection lenses (26) are equipped with imaging mirrors, and an object plane and an image plane in which a mask (14) and photosensitive layer (16) are arranged. A drive element is adapted to reflective switching elements such that projection light rays and heating light rays are emitted from the projection lenses corresponding to two different positions of switching elements. An independent claim is included for a method for operating microlithographic extreme UV projection exposure apparatus.

WO/2004/040625	EXPOSURE APPARATUS CONTROL METHOD AND DEVICE
WO/2022/025090	RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS
JP2001267392	METHOD AND EQUIPMENT FOR TRANSFERRING SUBSTRATE AND ALIGNER

Boris Bitner
Norbert Vabra

JP2012221683A

November 01, 2017

September 14, 2012

Click for automatic bibliography generation  

Carl Zeiss SGM Gaehha

G03F7/20; G02B17/00; G02B19/00

JP2005243771A
JP2011176311A
JP2008135742A
JP2005243680A
JP11150053A
JP6124871A

Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshinori Kishi

Previous Patent: Water meter

Next Patent: PRODUCTION OF 1,2-HEXADECANEDIOL