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Title:
化学反応用微細加工スリーブデバイス
Document Type and Number:
Japanese Patent JP4878663
Kind Code:
B2
Abstract:
A silicon-based sleeve type chemical reaction chamber that combines heaters, such as doped polysilicon for heating, and bulk silicon for convection cooling. The reaction chamber combines a critical ratio of silicon and non-silicon based materials to provide the thermal properties desired. For example, the chamber may combine a critical ratio of silicon and silicon nitride to the volume of material to be heated (e.g., a liquid) in order to provide uniform heating, yet low power requirements. The reaction chamber will also allow the introduction of a secondary tube (e.g., plastic) into the reaction sleeve that contains the reaction mixture thereby alleviating any potential materials incompatibility issues. The reaction chamber may be utilized in any chemical reaction system for synthesis or processing of organic, inorganic, or biochemical reactions, such as the polymerase chain reaction (PCR) and/or other DNA reactions, such as the ligase chain reaction, which are examples of a synthetic, thermal-cycling-based reaction. The reaction chamber may also be used in synthesis instruments, particularly those for DNA amplification and synthesis.

Inventors:
Northrup, M., Allen
Application Number:
JP52705298A
Publication Date:
February 15, 2012
Filing Date:
December 03, 1997
Export Citation:
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Assignee:
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
International Classes:
B01J19/00; C12N15/09; B01L3/00; B01L7/00; C12M1/00; C12Q1/68; G01N21/03; G01N21/05; G01N21/69; G01N21/76; B01L9/00; B81B1/00; B81C3/00
Domestic Patent References:
JP11509136A
JP7508928A
JP7506430A
Foreign References:
WO1994005414A1
Attorney, Agent or Firm:
Yasuo Ishikawa
Yoshinori Ishibashi



 
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