PURPOSE: To make a microgripper processable in accuracy of submicron by constituting an arm and a holding part of a specific surface silicon substrate.

CONSTITUTION: A microgripper 1 is constituted of at least two arms 2a, 2b and a holding part 3 of holding the arms 2a, 2b. A obverse/reverse of the microgripper 1 is constituted of a surface silicon substrate. In manufacture of this microgripper 1, a lengthwise direction of the arms 2a, 2b is accurately aligned in a vertical direction relating to a crystal axis of the silicon substrate. That is, a silicon nitride film and silicon film of about 2000 thickness, molded by a pressure reducing CVD method, are formed on the silicon substrate. Photoresist is applied onto this silicon substrate, to perform patterning by using an azimuth making mask. This patterning is used as an etching protective film, to perform a specific etching process.