Title:
MICROLITHOGRAPHY ILLUMINATING SYSTEM AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEM EQUIPPED THEREWITH
Document Type and Number:
Japanese Patent JP2001308006
Kind Code:
A
Abstract:
To provide an illuminating system, capable of utilizing a lens that is minimum in diameter and possessed an off-axis field.
An optical device of detecting all light flux (LB) with a plane steadily divided into fine parts or an optical device equivalent to this optical device is disposed near a field of view to be asymmetrically constituted about an optical axis.
Inventors:
WANGLER JOHANNES
KOHLER JESS
KOHLER JESS
Application Number:
JP2001094888A
Publication Date:
November 02, 2001
Filing Date:
March 29, 2001
Export Citation:
Assignee:
ZEISS CARL FA
International Classes:
G02B19/00; G02B13/14; G02B13/22; G02B13/24; G02B27/00; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G02B13/14; G02B13/22; G02B13/24; G02B19/00; G03F7/20
Attorney, Agent or Firm:
Masaki Yamakawa