Title:
マイクロニードル
Document Type and Number:
Japanese Patent JP7046728
Kind Code:
B2
Abstract:
According to the invention there is provided a method of manufacturing a plurality of silicon microneedles which have a bevelled tip, the method comprising the steps of:
providing a silicon substrate having a front face and a rear face;
forming a first mask arrangement on the front face of the substrate, the first mask arrangement defining one or more gaps;
performing a SF 6 based plasma etch of the front face through the gaps in the first mask arrangement to provide one or more etch features having a sloping face, wherein the SF 6 based plasma etch undercuts the first mask arrangement with an undercut that is at least 10% of the depth of a corresponding etch feature;
forming a second mask arrangement on the etch features to define locations of the microneedles, in which the second mask arrangement is located entirely on sloping faces of the etch features ; and
performing a DRIE (deep reactive ion etch) anisotropic plasma etch of the etched front face of the substrate to form a plurality of microneedles which have a bevelled tip, wherein the sloping faces of the etch features at least in part give rise to the bevelled tips of the microneedles.
Inventors:
Kelly Roberts
Huma Ashraf
Pen fening
Huma Ashraf
Pen fening
Application Number:
JP2018114224A
Publication Date:
April 04, 2022
Filing Date:
June 15, 2018
Export Citation:
Assignee:
STS Technologies Limited
International Classes:
A61M37/00; A61L31/06
Foreign References:
| WO2015059437A1 | ||||
| US20040126707 | ||||
| WO2009097660A1 |
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office
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