MICROWAVE PLASMA PROCESSING DEVICE - 株式会社日立製作所

Title:

MICROWAVE PLASMA PROCESSING DEVICE

Document Type and Number:

Japanese Patent JP2607832

Kind Code:

B2

Abstract:

PURPOSE: To generate uniform gas plasma stably in a plasma generating chamber, and improve uniformity in processing by making a microwave in a uniform mode incident on a plasma generation area.
CONSTITUTION: A microwave is generated by a magnetron 1, and is propagated in a rectangular wave guide 2, a converting wave guide 3 and a circular wave guide 4, and is made incident on a bell jar 5. The propagating microwave is divided in the wave guide 4 by a phase shifter composed of a cylinder 9 and a partition plate 10 arranged on the anti-sample stand 7 side of the bell jar 5, and forms a microwave in a uniform mode. On the other hand, gas for plasma processing is introduced in the bell jar 5 arranged airtightly in a vacuum vessel by a gas supply nozzle 8, and is held under prescribed processing pressure in a pressure reduced condition by a vacuum evacuation device. The gas in the bell jar 5 is transformed into plasma by incidence of the microwave in the uniform mode. Thereby, uniform plasma is formed in the bell jar 5.

Inventors:

Saikai Shoji
Yoshie Tanaka

Application Number:

JP31771293A

Publication Date:

May 07, 1997

Filing Date:

December 17, 1993

Export Citation:

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