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Title:
MIXING APPARATUS
Document Type and Number:
Japanese Patent JP2004188320
Kind Code:
A
Abstract:

To provide a mixing apparatus of gas and liquid capable of forming a satisfactory mixed state and an atomized state when mixing the gas and liquid, and constituting a vapor producing apparatus which is easily manufactured at low cost when being applied for the purpose of vapor production.

The liquid to be mixed is allowed to flow into the gas to be mixed at a prescribed angle (α) to the flowing direction of the gas and is mixed with the gas. After mixing, the gas and liquid are allowed to flow to the outside through a path. Therein, the ratio (L/D) of the length L of the path to the diameter D of cross-section of the path is set to be a predetermined value.


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JPH08177INDUSTRIAL APPLICABILITY A device that introduces a fluid into a receiving medium such as that of a liquid, particularly a water treatment facility.
WO/1998/046340SYSTEM AND METHOD FOR DELIVERY OF GAS-SUPERSATURATED FLUIDS
Inventors:
FUJII ATSUSHI
YOKOHAMA KATSUHIKO
TAKASHIMA RYUHEI
Application Number:
JP2002359462A
Publication Date:
July 08, 2004
Filing Date:
December 11, 2002
Export Citation:
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Assignee:
MITSUBISHI HEAVY IND LTD
International Classes:
B01F3/04; B01F5/02; (IPC1-7): B01F3/04; B01F5/02



 
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