PURPOSE: The titled molded article prepared by forming a crosslinked layer on having the characteristics of not easily dyeable with osmic acid on the surface of a molded vinyl chloride resin article, and forming a thin film layer easily dyeable with the osmic acid by using a silicon-containing compound on the crosslinked layer, and having the antistatic properties.
CONSTITUTION: A crosslinked layer 2 of ≤0.5μm thickness having the characteristics of not easily dyeable with osmic acid is formed on the surface of a substrate 1 consisting of a vinyl chloride resin by the low-temperature plasmatic treatment of an inorganic gas, etc. or irradiation with ultraviolet light in a vacuum, and a compound containing silicon atoms, e.g. various silane compounds or gasifiable low-molecular weight siloxane compounds, is applied to the crosslinked layer or a polymerized film is formed on the crosslinked layer by the low-temperature plasmatic treatment of the compound containing the silicon atom to form a thin film layer 3 with 1W90 atomic mol% silicon atoms by the elementary analysis according to the electron spectroscopy and preferably ≤1.5μm thickness and give the amied molded article.
SHIMURA YUKIO
TSUDA KEISHIROU
UENO SUSUMU
NOMURA HIROKAZU
IMADA KIYOSHI
SHINETSU CHEM IND CO
| JPS5749627A | 1982-03-23 |