Title:
改善されたイオン・カラム動作のための成形スパッタ・シールド
Document Type and Number:
Japanese Patent JP4743788
Kind Code:
B2
Abstract:
The invention adds one or more surface contour(s) to the bombarded area(s) within ion columns to greatly reduce the likelihood that back sputtered material will reach the ion generating source. A number of different surface contours are disclosed including angled surfaces, surfaces defining cups to capture back sputtered material, pre-textured and forested surfaces. The different surfaces can be used in any combination. The reduction in back sputtered material reaching the ion source reduces the time to stability, greatly increases the working stability, and increases the lifespan of the source.
Inventors:
James B. McGin
Greg Shwind
Greg Shwind
Application Number:
JP2006524701A
Publication Date:
August 10, 2011
Filing Date:
August 13, 2004
Export Citation:
Assignee:
F-I-I Company
International Classes:
H01J27/26; H01J27/00; H01J27/02; H01J37/08; H01J37/09; H01J37/30; H01J37/317; H01J
Domestic Patent References:
| JP3149732A | ||||
| JP2003123659A | ||||
| JP10208652A | ||||
| JP9316633A | ||||
| JP2002069634A | ||||
| JP2002515656A | ||||
| JP58178944A | ||||
| JP61034833A |
Attorney, Agent or Firm:
Masahiko Amagai