Title:
MONOMER FOR RESIST MATERIAL, POLYMER FOR RESIST MATERIAL AND ACID DISSOCIABLE GROUP-CONTAINING RESIN
Document Type and Number:
Japanese Patent JP2003327688
Kind Code:
A
Abstract:
To obtain a monomer for forming a resist highly transparent to radiation and satisfying a fundamental function, a polymer for a resist material and an acid dissociable group-containing resin used in a chemical amplification type resist.
The acid dissociable group-containing resin is insoluble or hardly soluble in alkali and becomes easily soluble in alkali by the action of an acid and has a repeating unit represented by formula (8) (wherein R1 and R3 are each a divalent organic group containing a fluorine atom, R2 is a lower hydrocarbon group and X is a side chain containing an acid dissociable group).
Inventors:
NISHIKUBO TATATOMI
KAMEYAMA ATSUSHI
KUDO HIROTO
KAMEYAMA ATSUSHI
KUDO HIROTO
Application Number:
JP2002133994A
Publication Date:
November 19, 2003
Filing Date:
May 09, 2002
Export Citation:
Assignee:
JSR CORP
UNIV KANAGAWA
UNIV KANAGAWA
International Classes:
G03F7/039; C07D305/06; C08G65/28; (IPC1-7): C08G65/28; G03F7/039
Attorney, Agent or Firm:
Waki
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