Title:
193nm用二層レジストに適するケイ素含有量の高いモノマーおよびポリマー
Document Type and Number:
Japanese Patent JP4046314
Kind Code:
B2
Abstract:
Compositions suitable for forming planarizing underlayers for multilayer lithographic processes are characterized by the presence of (A) a polymer containing: (i) cyclic ether moieties, (ii) saturated polycyclic moieties, and (iii) aromatic moieties for compositions not requiring a separate crosslinker, or (B) a polymer containing: (i) saturated polycyclic moieties, and (ii) aromatic moieties for compositions requiring a separate crosslinker. The compositions provide outstanding optical, mechanical and etch selectivity properties. The compositions are especially useful in lithographic processes using radiation less than 200 nm in wavelength to configure underlying material layers.
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Inventors:
Philip Joe Block
Richard Anthony Dipietro
Donald Clifford Hofer
Ratnam Soriyakumaran
Gregory Michael Wallraf
Richard Anthony Dipietro
Donald Clifford Hofer
Ratnam Soriyakumaran
Gregory Michael Wallraf
Application Number:
JP2001051017A
Publication Date:
February 13, 2008
Filing Date:
February 26, 2001
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
C08F30/08; C08F32/00; C08F230/08; C08K5/41; C08K5/54; C08L43/04; C08L45/00; G03F7/004; G03F7/038; G03F7/039; G03F7/075; G03F7/09; H01L21/027; G11B5/31
Domestic Patent References:
| JP10282678A | ||||
| JP11322856A | ||||
| JP2115853A | ||||
| JP63295611A | ||||
| JP2001201860A |
Attorney, Agent or Firm:
Hiroshi Sakaguchi
Yoshihiro City
Yoshihiro City