Title:
マルチ荷電粒子ビーム照射装置及びマルチ荷電粒子ビーム検査装置
Document Type and Number:
Japanese Patent JP7409946
Kind Code:
B2
Abstract:
A multi-charged particle beam irradiation apparatus includes a forming mechanism to form multiple charged particle beams, a multipole deflector array to individually deflect each beam of the multiple charged particle beams so that a center axis trajectory of each beam of the multiple charged particle beams may not converge in a region of the same plane orthogonal to the direction of a central axis of a trajectory of the multiple charged particle beams, and an electron optical system to irradiate a substrate with the multiple charged particle beams while maintaining a state where the multiple charged particle beams are not converged.
Inventors:
Kazuhiko Inoue
Masataka Shirato
Munehiro Ogasawara
Masataka Shirato
Munehiro Ogasawara
Application Number:
JP2020071726A
Publication Date:
January 09, 2024
Filing Date:
April 13, 2020
Export Citation:
Assignee:
New Flare Technology Co., Ltd.
International Classes:
H01J37/28; H01J37/147; H01J37/244; H01L21/027
Domestic Patent References:
JP2020047589A | ||||
JP2014229481A | ||||
JP2006080276A | ||||
JP2014519724A | ||||
JP2008215969A | ||||
JP2019200920A | ||||
JP9007538A |
Foreign References:
US20200090899 | ||||
US20120305798 | ||||
US20080230697 | ||||
US20190355546 |
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Masahiro Koshita
Akira Sudo
Masahiro Koshita
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