Title:
マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
Document Type and Number:
Japanese Patent JP7180515
Kind Code:
B2
Abstract:
In one embodiment, a multi charged particle beam writing apparatus includes a measurement unit measuring a first beam shape of a multi-beam based on a beam current of each beam of the multi-beam or an intensity of charged particles reflected from a reflection mark provided on a stage, an amounts of adjustment calculator calculating amounts of adjustment of a reduction ratio and a rotation angle of the multi-beam based on the first beam shape, a correction map generation unit generating a first correction map in which an amount of displacement is defined that is obtained for each beam of the multi-beam based on a difference between a beam shape based on the amounts of adjustment and the first beam shape, a writing data processor generating shot data in which an amount of irradiation with each beam of the multi-beam is defined by converting writing data in which information regarding a graphic pattern to be written is defined, and correcting the amount of irradiation with each beam defined in the shot data based on the first correction map, and a controller controlling the reduction ratio and rotation angle of the multi-beam based on the amounts of adjustment.
Inventors:
Osamu Iizuka
Application Number:
JP2019075739A
Publication Date:
November 30, 2022
Filing Date:
April 11, 2019
Export Citation:
Assignee:
New Flare Technology Co., Ltd.
International Classes:
H01L21/027; G03F7/20; H01J37/305
Domestic Patent References:
| JP2015029045A | ||||
| JP2003297732A | ||||
| JP2019029484A | ||||
| JP2019067881A | ||||
| JP2014007379A | ||||
| JP2017220615A | ||||
| JP2016103557A | ||||
| JP2016225357A | ||||
| JP6005500A |
Attorney, Agent or Firm:
Tsuyoshi Shigeno
Takayuki Shigeno
Takayuki Shigeno