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Title:
マルチ電子ビーム検査装置及びマルチ電子ビーム検査方法
Document Type and Number:
Japanese Patent JP7442375
Kind Code:
B2
Abstract:
A multi-electron beam inspection apparatus includes a multi-detector that includes a plurality of detection sensors each of which detects a secondary electron beam emitted due to that a target object is irradiated with a primary electron beam individually preset in multiple secondary electron beams emitted because the target object is irradiated with multiple primary electron beams, a reference image data generation circuit that generates reference image data of a position irradiated with each primary electron beam, based on design data serving as a basis of the pattern formed on the target object, a synthesis circuit that synthesizes, for each primary electron beam, the reference image data of the position irradiated with a primary electron beam concerned and portions of reference image data of positions irradiated with other primary electron beams different from the primary electron beam concerned, and a comparison circuit that compares synthetic reference image data having been synthesized, and secondary electron image data based on a value detected by the detection sensor which detects a secondary electron beam due to irradiation with the primary electron beam concerned.

Inventors:
Power Ogawa
Ryoichi Hirano
Mako Sugihara
Hiroshi Inoue
Application Number:
JP2020068594A
Publication Date:
March 04, 2024
Filing Date:
April 06, 2020
Export Citation:
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Assignee:
New Flare Technology Co., Ltd.
International Classes:
G01N23/2251; H01J37/22; H01J37/244; H01J37/28; H01J37/29; H01L21/66
Domestic Patent References:
JP2007019034A
JP2008233723A
JP2147883A
JP2010519697A
Foreign References:
WO2006093268A1
WO2019053174A1
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Masahiro Koshita