MULTI-LAYERED STRUCTURE AND MANUFACTURE THEREOF

Japanese Patent JP3452216

B2

PURPOSE: To improve the resistance to retort by constituting a compound or compounds of one kind or more selected out of an ethylene-vinyl acetate copolymer saponified material, adjusted terminal adjustment polyamide resin, a hindered phenol compound, aliphatic carboxylic acid alkaline earth metal salt and higher fatty acid metal salt and the like and specifying the percentage of respective components to be selected.
CONSTITUTION: A multi-layer structure is constituted of a compound or compounds (e) selected out of an ethylene-vinyl acetate copolymer saponified material (a), adjusted terminal adjustment polyamide (b), a hindered phenol compound (c), aliphatic carboxylic acid alkaline earth metal salt (d) and higher aliphatic salt and the like. A resin composition II of oxygen gas barrier properties, having the weight ratio of a:b being (70:30)-(96:4), and the blend ratio of (c) to the total amount of (a) and (b) is 0.01wt.%, while the blend ratio of (d) to the total amount of (a) and (b) is 0.5-15μmol/g in terms of metal, and the blend ratio of (e) to the total amount of (a) and (b) is 0.01-1wt.%, is formed and further a thermoplastic resin layer provided with permeability lower than that of a thermoplastic resin layer I is formed as an innermost layer.

Masahiko Toyozumi
Tomoyuki Yamamoto

JP21217594A

September 29, 2003

August 11, 1994

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Nippon Synthetic Chemical Industry Co., Ltd.

B65D81/34; B32B27/00; B32B27/08; B32B27/28; B32B27/32; B32B27/34; B32B27/36; C08L23/08; C08L31/04; (IPC1-7): B32B27/28; B32B27/34; B65D81/34

JP229450A
JP63179740A
JP6182946A
JP63236646A
JP62202735A
JP6345919A

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