Title:
多層膜形成方法及び多層膜形成装置
Document Type and Number:
Japanese Patent JP5160452
Kind Code:
B2
Abstract:
A multilayer film formation method enables the formation of a multilayer including a complex oxide layer and having the desired shape of an element without performing an etching process. The method positions a first mask (30A) above a substrate (S), forms an adhesion layer (36) and a lower electrode layer (37) on the substrate with the first mask by sputtering an adhesion layer target (T1) and a lower electrode layer target (T2), positions a second mask (30B) formed from a ceramic material above the lower electrode layer, superimposes a complex oxide layer (38) on the lower electrode layer with the second mask by sputtering an oxide layer target (T3), positions a third mask (30C) above the complex oxide layer, and superimposes an upper electrode layer (39) on the complex oxide layer with the third mask by sputtering an upper electrode layer target (T4).
Inventors:
Isao Kimura
Jimbo Taketo
Kikuchi Makoto
Hiroshi Nishioka
Zhou Benkou
Jimbo Taketo
Kikuchi Makoto
Hiroshi Nishioka
Zhou Benkou
Application Number:
JP2008553041A
Publication Date:
March 13, 2013
Filing Date:
December 20, 2007
Export Citation:
Assignee:
ULVAC, Inc.
International Classes:
C23C14/56; C23C14/04; C23C14/06; C23C14/34; C23C14/50; H01L21/31; H01L21/316; H01L41/09; H01L41/18; H01L41/22; H01L41/316; H01L41/39
Domestic Patent References:
| JPH0657412A | 1994-03-01 | |||
| JP2000133643A | 2000-05-12 | |||
| JP2004079991A | 2004-03-11 | |||
| JPH05255846A | 1993-10-05 | |||
| JP2006089793A | 2006-04-06 | |||
| JP2002158090A | 2002-05-31 |
Attorney, Agent or Firm:
Hironobu Onda
Makoto Onda
Makoto Onda