PURPOSE: To provide a multilayered mirror in which layers are provided with proper flatness, holes are not opened, and plural layers participate in reflection by reducing absorption by continuing the ion impact of a second layer until materials in amounts equal to the thickness of a second layer are removed at each time of repetition.
CONSTITUTION: Materials to be vaporized are placed in holders 10 and 12 surrounded by a cover 14, and the vaporization of the materials is operated by heating the holders 10 and 12. A substrate 16 is arranged at the upper part of the holders 10 and 12, and the vaporized materials are accumulated on it. This device is provided with an ion source 18 which generates an ion beam for removing those accumulated materials. Then, after a multilayered mirror is manufactured by allowing one material to permeate the layer of the other material, and removing the second material for the thickness of the original layer by etching. This process is repeated, and then the multilayered mirror in which the layer of one material which the other material permeates is repeated without any uniform alternating constitution of the different layers of the different materials can be obtained.
RUTOHERU SUHIRATOMAN
YAN FUERUHOOFUEN
