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Title:
MULTIREACTIVE LINEAR SILOXANE COMPOUND, SILOXANE-BASED POLYMER PRODUCED FROM THE COMPOUND, AND METHOD FOR PRODUCING ELECTRICAL INSULATING FILM USING THE POLYMER
Document Type and Number:
Japanese Patent JP2005170943
Kind Code:
A
Abstract:

To provide a multireactive siloxane compound capable of forming an electrical insulating film having excellent mechanical characteristics, heat stability, electrical insulating characteristics, and crack resistance, to provide a siloxane-based (co)polymer produced from the compound, and to provide a method for producing the electrical insulating film using the polymer.

This electrical insulating film is produced by dissolving the siloxane-based (co)polymer having a specified structure and, if necessary, a void-forming material in an organic solvent to prepare a coating liquid, coating a base plate with the coating liquid, and thermally curing the liquid.


Inventors:
RI ZAISHUN
SEON JONG BAEK
JEONG HYUN DAM
YIM JIN HEONG
SHIN HYEON JIN
Application Number:
JP2004358183A
Publication Date:
June 30, 2005
Filing Date:
December 10, 2004
Export Citation:
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Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
C07B61/00; C07F7/08; C07F7/18; C07F7/21; C08G77/04; C08G77/50; C08G77/60; G03F7/075; H01L21/312; (IPC1-7): C07F7/18; C07F7/21; C08G77/50; H01L21/312
Domestic Patent References:
JPH11181287A1999-07-06
JPH10330622A1998-12-15
JP2001348430A2001-12-18
JP2000212190A2000-08-02
JP2000351786A2000-12-19
JPH0912709A1997-01-14
Foreign References:
US5986124A1999-11-16
WO1996000758A11996-01-11
Attorney, Agent or Firm:
Mikio Hatta
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Toshifumi Fujii