【発明の名称】化学気相成長装置及び半導体装置の製造方法 - Ryoden Semiconductor System Engineering Co., Ltd.

Title:

【発明の名称】化学気相成長装置及び半導体装置の製造方法

Document Type and Number:

Japanese Patent JP3081860

Kind Code:

B2

More Like This:

WO/2012/143840	MEASUREMENT DEVICE AND METHOD FOR VAPOUR DEPOSITION APPLICATIONS
JPH0781185	INDUSTRIAL APPLICABILITY The winding type vapor deposition apparatus provided with a roll position adjusting mechanism.

Inventors:

Naoyuki Suenaga
Koichiro Tsutahara

Application Number:

JP27289792A

Publication Date:

August 28, 2000

Filing Date:

October 12, 1992

Export Citation:

Assignee:

Ryoden Semiconductor System Engineering Co., Ltd.
Mitsubishi Electric Corporation

International Classes:

C23C14/54; C23C16/455; C30B25/14; H01L21/205; H01L21/31; (IPC1-7): H01L21/205; C23C16/455; C30B25/14; H01L21/31

Domestic Patent References:

Attorney, Agent or Firm:

Kaneo Miyata (2 outside)

Previous Patent: 着脱自在メガネフレーム

Next Patent: 自動車用もの入れ